Marija Borna Tutuc

Title: Marija Borna Tutuc: Innovator in Semiconductor Technology

Introduction

Marija Borna Tutuc is a prominent inventor based in Villach, Austria. She has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase her innovative approach to solving complex engineering challenges.

Latest Patents

One of her latest patents is titled "Method of reducing trench depth variation from reactive ion etching process." This invention involves a semiconductor wafer with a main surface, where a first etch resistant mask is applied. The process includes a first reactive ion etching step that creates a first group of trenches, followed by a second etch resistant mask covering these trenches. A second reactive ion etching step is then performed, resulting in a second group of trenches that are laterally offset from the first group. This method ensures that the depth of the trenches in both groups is substantially equal.

Another notable patent is "Method and apparatus for determining lattice parameters of a strained III-V semiconductor layer." This invention describes a multi-layer arrangement of III-V semiconductor layers, including a strained layer with a specific concentration of a constituent element. The lattice parameters of this layer are determined through a series of scans in reciprocal space, allowing for precise measurement of strain and element concentration.

Career Highlights

Marija has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Infineon Technologies Austria AG. Her experience in these organizations has allowed her to develop and refine her innovative techniques in semiconductor processing.

Collaborations

Throughout her career, Marija has collaborated with notable colleagues such as Daniel Tutuc and Andrew Christopher Graeme Wood. These partnerships have contributed to her success and the advancement of semiconductor technology.

Conclusion

Marija Borna Tutuc is a trailblazer in the semiconductor field, with her patents reflecting her commitment to innovation and excellence. Her work continues to influence the industry and inspire future advancements in technology.