Eindhoven, Netherlands

Marianus A Van De Kerkhof

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marianus A Van De Kerkhof. Retrieved from https://idiyas.com/inventor/marianus-a-van-de-kerkhof

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Marianus A. Van De Kerkhof: Inventor of a Shadow-Mask Drawing Method.

Introduction

Marianus A. Van De Kerkhof is an inventor associated with Eindhoven, Netherlands. His recorded patent concerns a method for drawing a shadow mask from a perforated metal sheet.

Latest Patents

Van De Kerkhof’s listed patent is “Method of Drawing a Shadow Mask.” It describes drape-drawing a shadow mask from an apertured metal sheet whose tensile strength is greater in one direction than another. During the process, the sheet’s edges that extend substantially along the stronger direction are allowed to slip relative to the draw ring and pressure. This movement helps prevent the sheet from tearing. His recorded portfolio includes 1 patent.

Career Highlights

The available information associates Van De Kerkhof with U.S. Philips Corporation. His patent reflects work on a practical manufacturing technique for shaping shadow masks while reducing the risk of damage to the metal sheet.

Collaborations

Van De Kerkhof’s listed coworkers include Adrianus J. Van Denderen and Jan Van Der Waal.

Conclusion

Marianus A. Van De Kerkhof’s recorded invention addresses a specific challenge in shadow-mask production by allowing controlled sheet movement during drawing to help prevent tearing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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