The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1978
Filed:
Jun. 17, 1976
Applicant:
Inventors:
Adrianus J VAN Denderen, Eindhoven, NL;
Marianus A VAN DE Kerkhof, Eindhoven, NL;
Mathias A Peters, Eindhoven, NL;
Jan VAN DER Waal, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21D / ;
U.S. Cl.
CPC ...
72350 ; 72379 ; 72DI / ;
Abstract
A method of drape drawing a shadow mask from a foraminous, or apertured, metal sheet that has a greater tensile in one direction than another and has edges extending in the one direction. During the drape procedure, the edges of the sheet that extend substantially in the direction in which the sheet has the greater tensile strength are allowed to slip relative to the draw ring and the pressure. As a result of this, the sheet is prevented from tearing.