Marian C Tang

Title: Celebrating the Innovations of Marian C. Tang

Introduction

Marian C. Tang, an accomplished inventor based in Rodeo, California, has made significant contributions to the field of plasma technology. With two patents to her name, she has demonstrated a remarkable ability to innovate processes that enhance efficiency in etching aluminum, silicon dioxide, and silicon nitride, paving the way for advanced applications in semiconductor manufacturing.

Latest Patents

Marian C. Tang's latest innovations include two notable patents. The first is a "Process and Gas Mixture for Etching Aluminum" in a plasma environment within a planar reactor. This patent describes a unique gas mixture comprising a primary etching gas and a secondary gas that effectively controls the anisotropic character of the etch. By generating a stable and uniform plasma at relatively high pressure and power levels, this process substantially accelerates the removal of aluminum, achieving results that have previously been unattainable in planar reactors.

The second patent, "Process and Gas Mixture for Etching Silicon Dioxide and Silicon Nitride," presents a similar innovative approach tailored specifically for etching these materials. This method utilizes a gas mixture that comprises a primary etching gas and a secondary gas to control the selectivity of the etch. Conducted at relatively high pressure and power levels, this process also facilitates significant improvements in the speed of removing silicon dioxide and silicon nitride compared to past methods in planar reactors.

Career Highlights

Marian C. Tang is currently affiliated with Branson International Plasma Corporation, where she continues to develop cutting-edge technologies in plasma processing. Her dedication to innovation and research has not only advanced her career but has also contributed to the company's growth and standing within the industry.

Collaborations

Throughout her career, Marian has collaborated with talented colleagues including Diane C. Vogel and Richard F. Reichelderfer. These partnerships have fostered a creative environment, enabling the exchange of ideas and expertise, which is crucial in driving forward-thinking solutions in the field of plasma technology.

Conclusion

Marian C. Tang exemplifies the spirit of innovation through her impactful patents and collaborative work in the field of plasma processing. Her contributions to etching techniques are just the beginning of what promises to be a continued journey of discovery and advancement in technology. As she and her colleagues at Branson International Plasma Corporation push the boundaries of what is possible, the industry eagerly anticipates the next stage of innovation that Marian will bring to fruition.