This inventor holds 1 USPTO granted patent. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Maria Jeanne Schroevers - Innovator in Back-End Metallisation Processes
Introduction
Maria Jeanne Schroevers is a prominent inventor based in Eindhoven, Netherlands, known for her groundbreaking contributions to the field of engineering, particularly in back-end metallisation processes. With a strong focus on practical applications, her work has influenced advancements in semiconductor manufacturing.
Latest Patents
Maria Jeanne Schroevers holds a patent for a revolutionary back-end metallisation process. This invention outlines a method where a recess is filled with copper, including the crucial step of forming a plating base on the surfaces of the recess for subsequent galvanic deposition of copper. Notably, the process also integrates the introduction of a modifying agent that improves the surface characteristics, promoting copper growth and enhancing the quality of the plating fill.
Career Highlights
Maria is currently associated with Koninklijke Philips Corporation N.V., where her expertise continues to drive innovation in the company's technological endeavors. Her patent stands as a testament to her dedication and skill in advancing metallisation techniques, an essential area in electronic component manufacturing.
Collaborations
Throughout her career, Maria has collaborated closely with fellow innovator Eric Alexander Meulenkamp. Together, they have shared insights and knowledge, further enriching their contributions to the field and pushing the boundaries of what is possible in their respective domains.
Conclusion
Maria Jeanne Schroevers exemplifies the spirit of innovation through her patent and contributions to the field of metallisation. Her work not only enhances the efficiency of manufacturing processes but also serves as an inspiration for future inventors looking to make an impact in technology and engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
