The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2005

Filed:

Apr. 01, 2002
Applicants:

Eric Alexander Meulenkamp, Eindhoven, NL;

Maria Jeanne Schroevers, Eindhoven, NL;

Inventors:

Eric Alexander Meulenkamp, Eindhoven, NL;

Maria Jeanne Schroevers, Eindhoven, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 512 ; B05D 300 ; C25D 502 ; H01L 21288 ;
U.S. Cl.
CPC ...
Abstract

The invention provides for a back-end metallisation process in which a recess is filled with copper and which includes the step of forming a plating base on the surfaces of the recess for the subsequent galvanic deposition of the said copper, and wherein subsequent to the formation of the plating base, but prior to the galvanic deposition of the copper, a modifying agent is introduced to the recess and which serves to absorb in the surface regions not covered by the plating base and to thereby modify the surface to promote copper growth thereon so as to effectively repair the initial plating base before the copper plating fill commences.


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