Bainbridge, OH, United States of America

Maria G Mock

This inventor holds 1 USPTO granted patent. Top assignee: Keithley Instruments, Inc.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maria G Mock. Retrieved from https://idiyas.com/inventor/maria-g-mock

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Maria G Mock: Innovator in Electronic Measurement Technology

Introduction

Maria G Mock is a notable inventor based in Bainbridge, OH (US). She has made significant contributions to the field of electronic measurement and monitoring instruments. With a focus on innovation, Maria has developed technologies that enhance the accuracy and efficiency of electronic measurements.

Latest Patents

Maria holds a patent for an electronic measuring and monitoring instrument. This invention showcases her expertise and commitment to advancing technology in her field. Her patent is a testament to her innovative spirit and technical skills.

Career Highlights

Maria is currently employed at Keithley Instruments, Inc., where she continues to push the boundaries of electronic measurement technology. Her work at this esteemed company has allowed her to collaborate with other talented professionals in the industry.

Collaborations

Throughout her career, Maria has worked alongside notable colleagues such as Robert G Spinks and William J Kasprik. These collaborations have contributed to her success and the development of cutting-edge technologies in electronic measurement.

Conclusion

Maria G Mock is a pioneering inventor whose work in electronic measurement technology has made a lasting impact. Her dedication to innovation and collaboration continues to inspire others in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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