Margareth Seputro

Title: Margareth Seputro: Innovator in CMP Technology

Introduction

Margareth Seputro is a notable inventor based in Orlando, FL (US). She has made significant contributions to the field of chemical mechanical polishing (CMP) technology. With a total of 3 patents to her name, her work has had a substantial impact on the semiconductor industry.

Latest Patents

One of her latest patents is a system for using an offset gage for CMP polishing pad alignment and adjustment. This innovative method and system utilize an offset dial gage for the alignment and adjustment of a polishing pad attached to a turntable of a CMP device. In this embodiment, the offset dial gage contacts the side of the turntable, while a sensor tip assesses the edge of the polishing pad. This process allows for the evaluation of radial displacement of the polishing pad edge relative to the turntable. Based on these measurements, the polishing pad can be deemed acceptably positioned, trimmed, or replaced. This method significantly reduces or eliminates defect patterns associated with side unloading of semiconductor wafers from a CMP turntable.

Career Highlights

Margareth Seputro is currently employed at Agere Systems Inc., where she continues to innovate in her field. Her work has been instrumental in advancing CMP technology, which is crucial for the manufacturing of semiconductor devices.

Collaborations

Throughout her career, Margareth has collaborated with talented individuals such as Jose Omar Rodriguez and Charles A Storey. These collaborations have further enhanced her contributions to the industry.

Conclusion

Margareth Seputro is a pioneering inventor whose work in CMP technology has made a lasting impact on the semiconductor industry. Her innovative patents and collaborations reflect her dedication to advancing technology in this critical field.