Torun, Poland

Marek Sternal

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marek Sternal. Retrieved from https://idiyas.com/inventor/marek-sternal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Marek Sternal: Innovator in Imaging Technology

Introduction

Marek Sternal is a notable inventor based in Torun, Poland. He has made significant contributions to the field of imaging technology, particularly through his innovative patent that enhances the quality of tomographic images.

Latest Patents

Marek Sternal holds a patent for an "Imaging apparatus and imaging method." This invention provides an imaging apparatus designed to acquire a tomographic image of an object by utilizing light obtained from combining return light from the object, which is illuminated with measuring light, and reference light corresponding to the measuring light. The apparatus includes a reference-light amount changing unit that alters the reference-light amount and a control unit that manages this change to ensure optimal image quality.

Career Highlights

Marek Sternal is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His work at Canon has allowed him to focus on advancing imaging technologies that benefit various applications.

Collaborations

Marek has collaborated with talented individuals such as Kenji Muto and Krzysztof Wiśniewski, contributing to the development of innovative imaging solutions.

Conclusion

Marek Sternal's contributions to imaging technology through his patent and work at Canon highlight his role as an influential inventor in the field. His innovative approach continues to impact the way imaging is conducted, showcasing the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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