Marco Jan-Jaco Weiland

Title: Marco Jan-Jaco Weiland: Innovator in Lithography Technology

Introduction

Marco Jan-Jaco Weiland is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of methods for pattern data conversion. His innovative approach has implications for the efficiency and effectiveness of lithography systems.

Latest Patents

Weiland holds a patent for a method and system titled "Pattern data conversion for lithography system." This invention involves exposing a target according to pattern data in a maskless lithography machine. The process generates a plurality of exposure beamlets for exposing the target. The method includes providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to produce output pattern data. The output pattern data is then supplied to the lithography machine, where the generated beamlets are modulated based on this data. He has 1 patent to his name.

Career Highlights

Weiland is currently associated with Mapper Lithography IP B.V., a company that specializes in advanced lithography technologies. His work at Mapper Lithography has positioned him as a key player in the development of innovative solutions for the semiconductor industry.

Collaborations

One of his notable collaborators is Teunis Van De Peut, with whom he has worked closely on various projects related to lithography technology.

Conclusion

Marco Jan-Jaco Weiland's contributions to lithography technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of efficient lithography systems.