Marco Hug

Title: Marco Hug: Innovator in Phase Shift Mask Technology

Introduction

Marco Hug is a notable inventor based in South Burlington, VT (US). He has made significant contributions to the field of lithography, particularly in the design of phase shift masks. His innovative approach has led to advancements that enhance the precision of critical features in semiconductor manufacturing.

Latest Patents

Marco Hug holds 1 patent for his invention titled "Layout impact reduction with angled phase shapes." This patent describes a phase shift mask shape that effectively reduces line-end shortening at critical features without necessitating layout size increases. The design incorporates an angled extension that accounts for lithographic shortening values, allowing for a more accurate representation of critical shapes in relation to the reference layer.

Career Highlights

Throughout his career, Marco has worked with prominent companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Infineon Technologies North America Corp. His work in these organizations has contributed to the development of advanced semiconductor technologies.

Collaborations

Marco has collaborated with several professionals in his field, including Scott Josef Bukofsky and John Kenneth DeBrosse. These collaborations have fostered innovation and have been instrumental in the advancement of phase shift mask technology.

Conclusion

Marco Hug's contributions to the field of lithography and his innovative patent demonstrate his commitment to enhancing semiconductor manufacturing processes. His work continues to influence the industry and pave the way for future advancements.