This inventor holds 1 USPTO granted patent. Top assignee: W. R. Grace Co.-Conn.. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: Innovations by Marc S DeRosa
Introduction
Marc S DeRosa is an accomplished inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of protective methods for construction applications. His innovative approach has led to the creation of a unique patent that addresses challenges faced in backfill operations.
Latest Patents
Marc S DeRosa holds a patent for a method designed to protect subgrade vertical walls from stone impacts. This patent outlines an exemplary method for measuring the impact resistance of polymeric film-based laminates. The method involves a falling dart test using laminates that are fully adhered to an inclined mortar block, simulating stone impacts in backfill situations. The invention utilizes a four-layer laminate that demonstrates an impact energy of at least 50 lb-ft²/sec², showcasing its effectiveness in real-world applications.
Career Highlights
Marc is currently associated with W.R. Grace & Co. - Conn., where he applies his expertise in materials engineering. His work focuses on developing innovative solutions that enhance the durability and performance of construction materials. His contributions have been instrumental in advancing the company's research and development efforts.
Collaborations
Marc has collaborated with notable colleagues, including Robert F Jenkins and Robert A Wiercinski. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Marc S DeRosa's work exemplifies the spirit of innovation in materials science. His patent for protecting subgrade vertical walls demonstrates his commitment to solving practical challenges in construction. His contributions continue to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
