The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1995
Filed:
Aug. 04, 1993
Marc S DeRosa, Taipei, TW;
Robert F Jenkins, Wakefield, MA (US);
Robert A Wiercinski, Lincoln, MA (US);
Stephen J Agambar, Bucks, GB;
W. R. Grace & Co.-Conn., New York, NY (US);
Abstract
An exemplary method for measuring the impact resistance of polymeric film-based laminates involves a falling dart test using laminates that are essentially fully adhered to an inclined mortar block in emulation of stone impacts in backfill situations. Methods for protecting subgrade vertical walls from stone impacts in backfill operations involve the use of a four-layer laminate having an impact energy of at least 50 lb-ft.sup.2 /sec.sup.2 in accordance with a falling dart test using a mortar block inclined at an angle of 60.degree. from vertical. The film-based laminate, comprising a center film having a Young's modulus of at least 200,000 psi (ASTM D 882), is surprisingly discovered to have synergistic properties to provide an average impact energy, as determined in accordance with the 60.degree. impact test, which far exceeds the additive impact energy of the components and which reflects more accurately the performance of the laminate in the actual backfill situation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile