Company Filing History:
Years Active: 1995-2002
Title: The Innovations of Marc Michael Kollrack
Introduction
Marc Michael Kollrack is a notable inventor based in Alameda, CA (US). He has made significant contributions to the field of chemical vapor deposition, particularly in the deposition of amorphous silicon thin films. With a total of 4 patents to his name, Kollrack's work has advanced the technology used in thin film transistors.
Latest Patents
Kollrack's latest patents include a method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates. This innovative method allows for the deposition of amorphous silicon thin films at high rates using pressures of at least 0.8 Torr and temperatures ranging from 270-350°C. Improved transistor characteristics are achieved when the substrate is exposed to a hydrogen plasma prior to deposition or when a first layer of amorphous silicon is deposited using a slower process. Another significant patent involves multilayer CVD processing in a single chamber, enabling the deposition of thin films onto glass substrates under similar reaction conditions at high rates. This method allows for sequential deposition of silicon nitride and amorphous silicon in the same chamber, enhancing the efficiency of the process.
Career Highlights
Kollrack is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has been pivotal in advancing the technology surrounding chemical vapor deposition and thin film transistors.
Collaborations
Throughout his career, Kollrack has collaborated with esteemed colleagues such as Kam S Law and Robert M Robertson. These collaborations have contributed to the development of innovative solutions in the field of thin film technology.
Conclusion
Marc Michael Kollrack's contributions to the field of chemical vapor deposition and thin film transistors have made a significant impact on the industry. His innovative methods and patents continue to influence advancements in technology.