Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Marc J Olivares
Introduction
Marc J Olivares is an accomplished inventor based in New Braunfels, Texas. He has made significant contributions to the field of lithography through his innovative methods and devices. His work is particularly relevant in the semiconductor industry, where precision and accuracy are paramount.
Latest Patents
Marc J Olivares holds a patent for a lithography correction method and device. This method involves generating data that defines relationships between predetermined design layout parameters and known minimum required lithographic process capabilities, such as minimum feature spacing. The process includes upsizing predetermined isolated features or portions of isolated or semi-isolated features. The resulting wafer circuit pattern features isolated components that are larger than a predetermined minimum width. This innovative approach ensures that the upsized features in the wafer circuit pattern are larger than they are represented in the designed database. The method for correcting lithography errors is also stored on a computer-readable storage medium.
Career Highlights
Marc is currently employed at Freescale Semiconductor, Inc., where he applies his expertise in semiconductor technology. His work has contributed to advancements in lithography techniques, enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Marc has collaborated with notable colleagues, including Kirk J Strozewski and Kevin D Lucas. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Marc J Olivares is a prominent figure in the field of lithography, with a focus on improving semiconductor manufacturing processes. His patent and collaborative efforts highlight his commitment to innovation and excellence in technology.