This inventor holds 1 USPTO granted patent. Top assignee: Parker-Hannifin Corporation. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: The Innovations of Marc E LaRosee
Introduction
Marc E LaRosee is an accomplished inventor based in Winthrop, MA (US). He has made significant contributions to the field of electrochemical mechanical polishing. His innovative work has led to the development of a unique polishing article that enhances the efficiency of polishing processes.
Latest Patents
Marc E LaRosee holds a patent for a "Polishing article for electro-chemical mechanical polishing." This invention features a polishing pad or other shaped article designed for the electrochemical mechanical polishing (ECMP) of a workpiece. The article incorporates an electrically-conductive compound formed into a layer. This compound is an admixture that includes a polymeric component forming a continuous phase in the layer, along with an electrically-conductive filler component forming a discrete phase within the continuous phase. When the workpiece and the layer are electrically connected, and an electrical bias is applied, the compound exhibits an overpotential for the activation of the electrochemical reaction that is greater than the bias. This innovation is crucial for improving the performance of polishing processes.
Career Highlights
Marc E LaRosee is currently employed at Parker-Hannifin Corporation, a leading company in motion and control technologies. His work at Parker-Hannifin has allowed him to apply his expertise in developing advanced materials and processes that enhance product performance.
Collaborations
Throughout his career, Marc has collaborated with notable colleagues, including John J Hannafin and Kent M Young. These collaborations have contributed to the advancement of technologies in their respective fields.
Conclusion
Marc E LaRosee's contributions to the field of electrochemical mechanical polishing demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in polishing technology, showcasing the importance of research and development in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile