Company Filing History:
Years Active: 1985-2005
Title: The Innovations of Marc David Levenson
Introduction
Marc David Levenson is a notable inventor based in Saratoga, California, with a remarkable portfolio of 14 patents. His work primarily focuses on advancements in photolithography, a critical process in semiconductor manufacturing.
Latest Patents
One of his latest patents involves a photosensitive material for immersion photolithography. This invention addresses the challenges faced when rays of light converge inside a photosensitive material at angles larger than 70 degrees. In conventional exposure media, one polarization of the light may fail to produce the desired image contrast. Levenson's invention describes methods to suppress the effects of undesired polarization by utilizing a class of photosensitive media that is insensitive to that polarization. This media is more sensitive to the polarization that conveys the desired image contrast, along with optical configurations relevant to semiconductor manufacturing.
Career Highlights
Throughout his career, Marc has contributed significantly to the field of semiconductor technology. He has worked with prominent companies, including International Business Machines Corporation (IBM), where he further honed his expertise in photolithography and related technologies.
Collaborations
Marc has collaborated with several talented individuals in his field, including Hugo Alberto Santini and Gary C Bjorklund. Their combined efforts have led to innovative solutions and advancements in semiconductor manufacturing processes.
Conclusion
Marc David Levenson's contributions to the field of photolithography and semiconductor technology are noteworthy. His innovative patents and collaborations have significantly impacted the industry, showcasing his dedication to advancing technology.