The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2005

Filed:

Feb. 10, 2004
Applicant:

Marc David Levenson, Saratoga, CA (US);

Inventor:

Marc David Levenson, Saratoga, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/00 ;
U.S. Cl.
CPC ...
Abstract

When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes means of suppressing the effects of the undesired polarization by using a class of photosensitive media that are insensitive to that polarization and more sensitive to the polarization conveying the desired image contrast as well as by means of optical configurations relevant in the context of semiconductor manufacturing using photolithography.


Find Patent Forward Citations

Loading…