The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Feb. 10, 2004
Applicant:
Marc David Levenson, Saratoga, CA (US);
Inventor:
Marc David Levenson, Saratoga, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/00 ;
U.S. Cl.
CPC ...
Abstract
When rays of light converge inside a photosensitive material at angles larger than 70 degrees, one polarization of the light may fail to produce the desired image contrast in conventional exposure media. This invention describes a material which may be applied to a semiconductor wafer surface which ensures that the photosensitive material is exposed principally by light polarized parallel to the semiconductor wafer surface.