Yavne, Israel

Manuela Hod

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Orbotech Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manuela Hod. Retrieved from https://idiyas.com/inventor/manuela-hod

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Manuela Hod: Innovator in Photoreactive Material Technology

Introduction

Manuela Hod is a notable inventor based in Yavne, Israel. He has made significant contributions to the field of photoreactive materials, particularly in enhancing the efficiency of resist patterning. His innovative work has implications for various applications in the technology sector.

Latest Patents

Manuela Hod holds a patent for a system designed to enhance the efficiency of resist patterning. This direct imaging system incorporates an ultraviolet radiation source that irradiates a specific area of a layer of photoreactive material on a substrate. The system also includes a thermal energy source that heats another area of the photoreactive material while the ultraviolet radiation is applied. This innovative approach allows for improved precision and efficiency in the patterning process.

Career Highlights

Manuela Hod is currently employed at Orbotech Limited, a company known for its advanced technology solutions in the electronics manufacturing industry. His work at Orbotech has allowed him to develop and refine his patented technology, contributing to the company's reputation for innovation.

Collaborations

Manuela has collaborated with several talented individuals in his field, including Ofer Fogel and Uri Gold. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Manuela Hod's contributions to the field of photoreactive materials and resist patterning demonstrate his commitment to innovation and excellence. His work continues to influence the technology sector, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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