Kariya City, Japan

Manami Sugiyama

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Coorstek Kk. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manami Sugiyama. Retrieved from https://idiyas.com/inventor/manami-sugiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Manami Sugiyama and Ceramic Materials for Semiconductor Equipment.

Introduction

Manami Sugiyama is an inventor associated with Kariya City, Japan, and Coorstek Kk. Her patent work concerns ceramic materials designed for semiconductor production equipment.

Latest Patents

Sugiyama is credited with 1 patent: “Ceramic Sintered Body for Semiconductor Production Equipment and Manufacturing Method Thereof.” The invention describes a process for producing a high-density oxyfluoride ceramic sintered body without requiring unusual manufacturing conditions.

The ceramic body has either an oxyfluoride main phase, with at least 50% of its crystals measuring 1 to 5 μm, or a combination of oxyfluoride and fluoride phases. Its color values in the L*a*b* system fall within specified ranges: L* from 20 to 65, and a* and b* each from −1 to 10.

Career Highlights

The available information connects Sugiyama’s inventive work with Coorstek Kk and the development of ceramic materials for semiconductor production equipment. Her patent focuses on material structure, color characteristics, and a practical manufacturing method.

Collaborations

The provided information identifies Coorstek Kk as Sugiyama’s company affiliation. No additional collaborators or institutional partnerships are specified.

Conclusion

Manami Sugiyama’s patent addresses the manufacture of high-density oxyfluoride ceramics for semiconductor equipment, combining defined material properties with a method intended to avoid unusual production conditions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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