Hamura, Japan

Manabu Otake

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi, Ltd., Honda Motor Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manabu Otake. Retrieved from https://idiyas.com/inventor/manabu-otake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Manabu Otake: Innovator in Semiconductor Manufacturing

Introduction

Manabu Otake is a notable inventor based in Hamura, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent. His work has implications for the efficiency and reliability of semiconductor devices.

Latest Patents

Otake holds a patent for a manufacturing method of semiconductor devices. This method involves embedding a tungsten film inside a conductive groove formed in a wafer, along with a silicon oxide film that has a high aspect ratio. The process allows for the film formation and etch back of the tungsten film to be performed successively in the same apparatus. This innovation ensures that the tungsten film's thickness is kept thin, thereby avoiding issues such as exfoliation, micro-cracks, and warpage of the wafer.

Career Highlights

Throughout his career, Manabu Otake has worked with prominent companies such as Hitachi, Ltd. and Honda Motor Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Otake has collaborated with notable colleagues, including Toshio Saito and Akira Otaguro. Their combined efforts have further advanced the field of semiconductor manufacturing.

Conclusion

Manabu Otake's contributions to semiconductor manufacturing through his innovative patent demonstrate his significant role in the industry. His work continues to influence the development of reliable and efficient semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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