Daejeon, South Korea

Man Young Park

This inventor holds 1 USPTO granted patent. Top assignee: Dnf Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Man Young Park. Retrieved from https://idiyas.com/inventor/man-young-park-jpr4vhhb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Man Young Park - Innovator in Anti-Glare Glass Technology.

Introduction

Man Young Park is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of anti-glare glass technology. His innovative approach has led to advancements that enhance visibility and durability in glass products.

Latest Patents

Man Young Park holds 1 patent for his invention titled "Anti-glare glass and manufacturing method therefor." This patent describes an anti-glare glass that exhibits excellent anti-glare properties and visibility. The technology involves applying polysilazane-derived surface unevenness to a glass surface without mixing in heterogeneous elements. This method significantly improves wear resistance and durability, as the polysilazane is thermally treated to bond with the glass surface.

Career Highlights

Park is currently employed at DNF Co., Ltd., where he continues to innovate and develop new technologies. His work has positioned him as a key figure in the advancement of glass manufacturing techniques.

Collaborations

He collaborates with talented individuals such as Myong Woon Kim and Ki Hoon Song, contributing to a dynamic research environment that fosters innovation.

Conclusion

Man Young Park's contributions to anti-glare glass technology exemplify the impact of innovative thinking in materials science. His work not only enhances product performance but also sets a standard for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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