Man Siu Tse

Title: The Innovative Contributions of Man Siu Tse

Introduction

Man Siu Tse is a notable inventor based in Singapore, recognized for her significant contributions to the field of semiconductor manufacturing. With a focus on enhancing the performance of copper interconnects, her work has implications for the advancement of electronic devices.

Latest Patents

One of her key patents is titled "Method to form high performance copper damascene interconnects by de-coupling via and metal line filling." This innovative method involves a series of steps to create robust dual damascene interconnects. The process begins with the deposition of a first dielectric layer over a silicon nitride layer, followed by the application of a shielding layer. The layers are then patterned to form via trenches, which are subsequently lined with a first barrier layer. The trenches are filled with a first copper layer, polished, and capped with a second barrier layer. The method continues with the deposition of a second dielectric layer and a capping layer, leading to the formation of connective line trenches. The connective line trenches are filled with a second copper layer, which is also polished down to complete the process. This patent showcases her expertise in semiconductor technology and her commitment to innovation.

Career Highlights

Man Siu Tse is currently employed at Chartered Semiconductor Manufacturing Ltd, where she applies her knowledge and skills to advance semiconductor technologies. Her work has not only contributed to her company's success but has also positioned her as a leader in her field.

Collaborations

Throughout her career, Man Siu Tse has collaborated with esteemed colleagues, including Yeow Kheng Lim and Alex See. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Man Siu Tse's contributions to semiconductor manufacturing through her innovative patent demonstrate her significant impact on the industry. Her work continues to influence the development of high-performance electronic devices, showcasing the importance of innovation in technology.