Mamoru Ishida

Title: Mamoru Ishida: Innovator in Semiconductor Technology

Introduction

Mamoru Ishida is a prominent inventor based in Yokohama, Japan, known for his significant contributions to semiconductor technology. With a total of three patents to his name, Ishida has made notable advancements in the field, particularly in the design and manufacturing of semiconductor devices.

Latest Patents

Ishida's latest patents include a semiconductor device and a manufacturing method for the same. This semiconductor device features a multilayer interconnection structure, which includes a substrate with a metal interconnect layer and multiple layers of insulating film. Each insulating layer contains a metal interconnect layer with bonding pad sections and via holes filled with electrically conductive material for interconnecting the layers. Additionally, he has developed a MIS semiconductor device with a polysilicon gate electrode, which comprises a gate oxide layer and a polysilicon gate electrode doped with boron, enhancing its performance.

Career Highlights

Throughout his career, Mamoru Ishida has worked with notable companies such as Ricoh Company, Ltd. and Ricoh Research Institute of General Electronics. His work has significantly impacted the semiconductor industry, leading to innovations that improve device efficiency and functionality.

Collaborations

Ishida has collaborated with esteemed colleagues, including Kazunori Ito and Mitsugu Irinoda, contributing to various projects that advance semiconductor technology.

Conclusion

Mamoru Ishida's work in semiconductor technology exemplifies innovation and dedication to advancing the field. His patents and collaborations reflect his commitment to improving electronic devices, making him a key figure in the industry.