Mamoru Furuta

Title: Mamoru Furuta: Innovator in Semiconductor Technology

Introduction

Mamoru Furuta is a prominent inventor based in Kochi, Japan, known for his significant contributions to semiconductor technology. With a total of five patents to his name, Furuta has made strides in the manufacturing methods of semiconductor devices and thin film transistors.

Latest Patents

Furuta's latest patents include a manufacturing method of a semiconductor device that incorporates an active layer of zinc oxide with controlled crystal lattice spacing. This innovative method involves forming an oxide semiconductor thin film layer of zinc oxide, ensuring that a portion of the layer has lattice planes oriented perpendicularly to the substrate with a lattice spacing of at least 2.619 Å. Another notable patent is for a manufacturing method of thin film transistors that includes low resistance conductive thin films. This method outlines the formation of source and drain electrodes on a substrate, the creation of low resistance conductive thin films, and the integration of an oxide semiconductor thin film layer that functions as a channel.

Career Highlights

Furuta has worked with notable organizations such as the Kochi Industrial Promotion Center and Casio Computer Co., Ltd. His experience in these institutions has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Furuta has collaborated with esteemed colleagues, including Takashi Hirao and Takahiro Hiramatsu. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Mamoru Furuta's work in semiconductor technology exemplifies the impact of innovative thinking and collaboration in advancing modern electronics. His patents reflect a commitment to enhancing the efficiency and functionality of semiconductor devices.