Mammoud Dahimene

Title: The Innovative Contributions of Mammoud Dahimene

Introduction

Mammoud Dahimene is a notable inventor based in Gaithersburg, MD (US). He has made significant contributions to the field of semiconductor technology. His work primarily focuses on improving processes related to photoresist stripping and residue removal.

Latest Patents

Dahimene holds a patent for an innovative method titled "Oxygen Free Plasma Stripping Process." This method is designed for stripping photoresist and removing post-etch residues from an exposed low k dielectric layer of a semiconductor wafer. The process involves creating an oxygen-free plasma by subjecting an oxygen-free gas to an energy source. This generates plasma containing both electrically neutral and charged particles. The charged particles are selectively removed, while the neutral particles react with the photoresist and residues to form volatile gases, which are then eliminated from the wafer by a gas stream. The gas composition for this process includes a hydrogen-bearing gas and a fluorine-bearing gas, with the latter being less than about 10 percent by volume of the total gas composition.

Career Highlights

Mammoud Dahimene is currently employed at Axcelis Technologies, Inc., where he continues to advance semiconductor processing technologies. His expertise in plasma technology has positioned him as a valuable asset in the industry.

Collaborations

Dahimene has collaborated with several professionals in his field, including coworkers Qingyuan Han and Ivan Berry. Their collective efforts contribute to the ongoing innovation at Axcelis Technologies.

Conclusion

Mammoud Dahimene's work in the development of the oxygen-free plasma stripping process exemplifies his commitment to advancing semiconductor technology. His contributions are vital to improving manufacturing processes in the industry.