Company Filing History:
Years Active: 2015
Title: Mami Nonoguchi: Innovator in Thin Film Semiconductor Technology
Introduction
Mami Nonoguchi is a prominent inventor based in Hyogo, Japan. She has made significant contributions to the field of semiconductor technology, particularly through her innovative work on thin film semiconductor devices. Her expertise and dedication to research have led to the development of a unique patent that addresses critical aspects of semiconductor manufacturing.
Latest Patents
Mami Nonoguchi holds a patent for a thin film semiconductor device and its manufacturing method. This device comprises a substrate, a gate electrode positioned above the substrate, and an oxide semiconductor layer that opposes the gate electrode. Additionally, it features a channel protective layer on the oxide semiconductor layer, along with source and drain electrodes connected to the oxide semiconductor layer. The patent outlines specific conditions regarding the density of states (DOS) of oxygen defects in the oxide semiconductor layer, ensuring optimal performance and reliability.
Career Highlights
Throughout her career, Mami Nonoguchi has been associated with Joled Inc., where she has played a vital role in advancing semiconductor technology. Her innovative approach and technical skills have contributed to the company's reputation as a leader in the field. With a focus on research and development, she continues to push the boundaries of what is possible in semiconductor devices.
Collaborations
Mami Nonoguchi has collaborated with notable colleagues, including Hiroshi Hayashi and Tomoaki Izumi. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Mami Nonoguchi's contributions to thin film semiconductor technology exemplify her commitment to innovation and excellence. Her patent and work at Joled Inc. highlight her role as a key player in the advancement of semiconductor devices. Through her efforts, she continues to inspire future generations of inventors and researchers in the field.