Delft, Netherlands

Maksym Chernyshov

This inventor holds 2 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maksym Chernyshov. Retrieved from https://idiyas.com/inventor/maksym-chernyshov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Maksym Chernyshov: Pioneering Innovation in Lithographic Technology

Introduction:

Maksym Chernyshov, a visionary inventor based in Delft, Netherlands, is a driving force in the realm of lithographic technology. With a keen eye for innovation and a collaborative spirit, Chernyshov continues to push boundaries and reshape industries.

Latest Patents:

Chernyshov's latest patents showcase his expertise in lithographic apparatus and device manufacturing methods. These patents highlight his prowess in designing systems that utilize gas delivery and temperature control to enhance the lithographic process.

Career Highlights:

As a key figure at ASML Netherlands B.V., Chernyshov plays a pivotal role in advancing lithographic technology. His dedication to research and development has led to the successful implementation of cutting-edge systems that have revolutionized the industry.

Collaborations:

Chernyshov collaborates closely with talented individuals such as Manish Ranjan and Carlo Cornelis Maria Luijten. Together, they form a dynamic team that fosters creativity and innovation, driving forward groundbreaking projects and shaping the future of lithography.

Conclusion:

In conclusion, Maksym Chernyshov's remarkable achievements in the field of lithographic technology are a testament to his passion for innovation and his commitment to pushing the boundaries of what is possible. His collaborative approach and transformative inventions not only benefit industries today but also inspire future generations of inventors to think boldly and dream big in their pursuit of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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