Chuo-ku, Japan

Makoto Terasawa

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tdk Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Makoto Terasawa. Retrieved from https://idiyas.com/inventor/makoto-terasawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Makoto Terasawa: Innovator in Pattern Film Technology

Introduction

Makoto Terasawa is a prominent inventor based in Chuo-ku, Japan. He is known for his innovative contributions to the field of pattern film technology. His work has significantly advanced the methods used in the manufacturing processes of various electronic components.

Latest Patents

Terasawa holds a patent for a "Method for forming a pattern film with a narrower width." This invention provides a method for creating a pattern film that is narrower than the resolution of an exposure machine. The process involves several steps, including the formation of frame layers and a trench-forming film, ultimately leading to the creation of a precise pattern film.

Career Highlights

Makoto Terasawa is associated with TDK Corporation, a leading company in electronic components. His expertise and innovative approach have contributed to the company's reputation for quality and precision in manufacturing.

Collaborations

Throughout his career, Terasawa has worked alongside talented colleagues such as Hirotaka Gomi and Mitsuharu Isobe. Their collaborative efforts have fostered an environment of innovation and creativity within their projects.

Conclusion

Makoto Terasawa's contributions to pattern film technology exemplify the spirit of innovation in the electronics industry. His patent and work at TDK Corporation highlight the importance of precision in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…