This inventor holds 1 USPTO granted patent. Top assignee: Laserfront Technologies, Inc.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: The Innovations of Makoto Oomiya
Introduction
Makoto Oomiya is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for correcting defects on semiconductor substrates.
Latest Patents
Oomiya holds a patent for a "Method and device for correcting pattern film on a semiconductor substrate." This invention addresses the issue of white defects on the surface of substrates. The process involves holding the substrate with the surface facing downward and irradiating laser light upward at the defect while in a material gas. As a result, the white defect is effectively covered with film. He has 1 patent to his name.
Career Highlights
Makoto Oomiya is currently employed at Laserfront Technologies, Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the quality and reliability of semiconductor devices.
Collaborations
Oomiya collaborates with Yukio Morishige, a fellow innovator in the field. Together, they work on advancing technologies that improve semiconductor manufacturing processes.
Conclusion
Makoto Oomiya's contributions to semiconductor technology exemplify the spirit of innovation. His patented methods are paving the way for advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile