This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2022.
Company Filing History:
Years Active: 2022
Title: Makoto Ishigo: Innovator in Film Deposition Technology
Introduction
Makoto Ishigo is a notable inventor based in Iwate, Japan. He has made significant contributions to the field of film deposition technology. His innovative approach has led to the development of a unique cleaning method that enhances the efficiency of film deposition apparatuses.
Latest Patents
Ishigo holds a patent for a cleaning method and film deposition method. This method involves a cleaning process for dry cleaning a susceptor located in a process chamber of a film deposition apparatus. In this method, a protective member is placed on a substrate receiving region of the susceptor. A cleaning gas is then supplied to the susceptor, effectively removing a film deposited on its surface through etching. This innovative technique is crucial for maintaining the performance of film deposition equipment.
Career Highlights
Makoto Ishigo is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this esteemed organization has allowed him to further develop his expertise in film deposition technologies. With 1 patent to his name, Ishigo continues to push the boundaries of innovation in his field.
Collaborations
Ishigo has collaborated with notable colleagues such as Hitoshi Kato and Jun Sato. Their combined efforts have contributed to advancements in the technology surrounding film deposition and cleaning methods.
Conclusion
Makoto Ishigo is a prominent figure in the realm of film deposition technology. His innovative cleaning method has the potential to significantly improve the efficiency of film deposition processes. Through his work at Tokyo Electron Limited and collaborations with esteemed colleagues, Ishigo continues to make strides in his field.