Hyogo, Japan

Makoto Hirayama


Average Co-Inventor Count = 1.2

ph-index = 4

Forward Citations = 48(Granted Patents)


Location History:

  • Itami, JP (1989)
  • Hyogo, JP (1989 - 1994)

Company Filing History:


Years Active: 1989-1994

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5 patents (USPTO):Explore Patents

Title: Makoto Hirayama: Innovator in Semiconductor Technology

Introduction

Makoto Hirayama is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have led to advancements in electronic components and thin film formation techniques.

Latest Patents

Hirayama's latest patents include a method for forming a thin film on a semiconductor device. This method involves transferring the substrate between an auxiliary chamber with an inert atmosphere and a reaction chamber with a reactive atmosphere, allowing both atmospheres to coexist during the transfer. Another notable patent is for an electronic component featuring improved low resistance contact. This design includes a lower electrode made from silicon or polycrystalline silicon, a dielectric film, and an upper electrode. The process ensures that an incidental oxide film is prevented, thereby enhancing the contact characteristics of the component.

Career Highlights

Hirayama is currently associated with Mitsubishi Denki Kabushiki Kaisha, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing methods that improve the efficiency and performance of electronic devices.

Collaborations

Throughout his career, Hirayama has collaborated with notable colleagues such as Shinichi Satoh and Masao Nagatomo. These partnerships have fostered a creative environment that has led to groundbreaking innovations in their field.

Conclusion

Makoto Hirayama's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a commitment to enhancing electronic components and improving manufacturing processes. His work continues to influence the industry and inspire future advancements.

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