Kyoto, Japan

Makoto Hanabata


Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 89(Granted Patents)


Location History:

  • Hyogo, JP (2002)
  • Kyoto, JP (2001 - 2009)

Company Filing History:


Years Active: 2001-2009

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6 patents (USPTO):Explore Patents

Title: Makoto Hanabata: Innovator in Photosensitive Compounds

Introduction

Makoto Hanabata is a distinguished inventor based in Kyoto, Japan. He has made significant contributions to the field of optically active compounds and photosensitive resin compositions. With a total of 6 patents to his name, Hanabata's work is recognized for its innovative applications in photolithography and material science.

Latest Patents

Hanabata's latest patents include a novel optically active compound and a photosensitive resin composition. The optically active compound is designed to work in conjunction with a photosensitizer, featuring a unique formula that allows for high sensitivity to short wavelength light sources. This characteristic makes it particularly advantageous for creating high-resolution patterns in resist applications. Additionally, his photosensitive resin composition incorporates an active component selected from a specific metal alkoxide or its polycondensate, further enhancing its utility in various applications.

Career Highlights

Throughout his career, Hanabata has worked with notable organizations such as Kansai Research Institute, Inc. and Osaka Gas Company Limited. His experience in these companies has allowed him to refine his expertise in the development of advanced materials and innovative chemical processes.

Collaborations

Hanabata has collaborated with esteemed colleagues, including Tokugen Yasuda and Masahiro Sato. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Makoto Hanabata's contributions to the field of photosensitive compounds and his innovative patents underscore his role as a leading inventor in the industry. His work continues to influence advancements in material science and photolithography.

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