Yokohama, Japan

Makoto Ariga


Average Co-Inventor Count = 7.1

ph-index = 4

Forward Citations = 128(Granted Patents)


Company Filing History:


Years Active: 1988-2004

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4 patents (USPTO):Explore Patents

Title: Innovator Makoto Ariga: Pioneering Process Management Systems

Introduction

Makoto Ariga is an accomplished inventor based in Yokohama, Japan, known for his innovative contributions to the field of process management systems. With a total of four patents to his name, Ariga has made significant strides in improving the inspection procedures for defects on semiconductor wafers.

Latest Patents

Among his latest patents, Ariga has developed a noteworthy process management system. This system integrates inspection apparatuses that detect defects on wafers, all interconnected through a communication network. The system collects inspection and image information from these apparatuses to construct a comprehensive database and image file. By defining defects through various elements characterizing them, the system allows for a deeper understanding of the nature and causes of defects. This innovative approach enables the subdivision and detailed study of defect characteristics.

Career Highlights

Throughout his career, Makoto Ariga has worked with prominent companies, such as Hitachi, Ltd. His experience at these reputable organizations has shaped his expertise in developing cutting-edge technologies in process management.

Collaborations

Ariga has collaborated with talented peers in his field, including notable individuals such as Seiji Hata and Fumio Mizuno. These collaborations have enriched his research and innovation efforts, further enhancing the quality and impact of his inventions.

Conclusion

Makoto Ariga stands out as a visionary inventor dedicated to advancing process management technologies. His commitment to innovation and collaboration continues to pave the way for improvements in the semiconductor industry, demonstrating the importance of effective inspection techniques in ensuring quality and performance.

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