This inventor holds 1 USPTO granted patent. Top assignee: Nissan Motor Company Limited. Active years: 1998.
Company Filing History:
Years Active: 1998
Title: Makiko Mitamura: Innovator in Semiconductor Etching Technology
Introduction
Makiko Mitamura is a prominent inventor based in Fujisawa, Japan. She has made significant contributions to the field of semiconductor technology, particularly in the etching processes used for semiconductor substrates. Her innovative work has implications for the development of pressure and acceleration sensors.
Latest Patents
Mitamura holds a patent for a process for etching semiconductors using hydrazine and metal. This etching process is designed for silicon semiconductor substrates and is crucial for producing semiconductor pressure sensors and acceleration sensors. The patent outlines a two-step process: first, a pre-etching step that involves dipping the semiconductor in hydrazine hydrate without applying voltage, followed by an electrochemical etching step using an alkali system etching solution containing hydrazine, potassium hydroxide, and water.
Career Highlights
Makiko Mitamura is currently employed at Nissan Motor Company Limited, where she applies her expertise in semiconductor technology. Her work has been instrumental in advancing the capabilities of sensors used in automotive applications.
Collaborations
Mitamura has collaborated with notable colleagues, including Yasukazu Iwasaki and Norihiko Kiritani. These partnerships have fostered innovation and enhanced the development of semiconductor technologies within her organization.
Conclusion
Makiko Mitamura's contributions to semiconductor etching processes highlight her role as a leading inventor in the field. Her innovative patent and collaborative efforts continue to influence advancements in sensor technology.