Company Filing History:
Years Active: 2015-2021
Title: Maki Kawamura: Innovator in Photoresist Technology
Introduction
Maki Kawamura is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 5 patents. His work has been instrumental in advancing the methods used in semiconductor manufacturing.
Latest Patents
Kawamura's latest patents include a photoresist composition that comprises a resist composition and a method for producing a resist pattern. The resist composition contains a novolak resin (A1) with a protective group that can be cleaved by the action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D). The method for producing a resist pattern involves several steps: (1) applying the resist composition onto a substrate, (2) drying the applied composition to form a composition layer, (3) exposing the composition layer, and (4) developing the exposed composition layer.
Career Highlights
Kawamura is currently employed at Sumitomo Chemical Company, Limited, where he continues to innovate in the field of chemical engineering. His expertise in photoresist technology has positioned him as a key player in the industry.
Collaborations
Some of his notable coworkers include Junji Nakanishi and Masako Sugihara, who contribute to the collaborative efforts in research and development within their organization.
Conclusion
Maki Kawamura's contributions to photoresist technology and his innovative patents reflect his dedication to advancing the field. His work at Sumitomo Chemical Company, Limited, along with his collaborations, continues to influence the semiconductor industry.