Sumitomo Chemical Company, Limited

Maki Kawamura

Masako Sugihara

Junji Nakanishi

Makoto Akita

Maiko Goda

Photoresist composition

A resist composition contains: a novolak resin (A1) having a protective group capable of being cleaved by action of an acid, an acid generator (B), an anticorrosive agent (G), and a solvent (D) as well as a method for producing a resist pattern includes steps (1) to (4); (1) applying the resist composition according to the above onto a substrate; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; and (4) developing the exposed composition layer.

Resist composition and method for producing resist pattern

A photoresist composition comprising: wherein the ring Wis a nitrogen-containing heterocyclic ring, or a benzene ring having a substituted or unsubstituted amino group,

A chemical amplified photoresist composition containing a resin, an acid generator, and a compound of formula (X): wherein R, R, R, R, Rand Reach independently represent a hydrogen atom, a hydroxyl group, a carboxy group, &#x2014;SO, &#x2014;NH, a halogen atom, a mercapto group, a C1-C12 alkyl group optionally having a substituent, a C6-C30 aryl group optionally having a substituent, a C3-C12 cycloalkyl group optionally having a substituent, and Rand Reach independently represent a hydrogen atom, a hydroxyl group, a carboxy group, &#x2014;SO, &#x2014;NH, a halogen atom, a mercapto group, a C1-C12 alkyl group optionally having a substituent, a C6-C30 aryl group optionally having a substituent, or a C3-C12 cycloalkyl group optionally having a substituent, or Rand Rare bonded each other to form a ring together with carbon atoms binding Rand Rand with the carbon atoms forming the bond between the pyridine rings.

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Osaka, Japan

Maki Kawamura