Company Filing History:
Years Active: 2018-2022
Title: **Inventor Profile: Maarten van der Burgt**
Introduction
Maarten van der Burgt is a notable inventor based in Leuven, Belgium. With a total of three patents to his name, he has made significant contributions to the field of optical measurement technologies, showcasing his inventive prowess and technical expertise.
Latest Patents
Among his latest innovations is a patented **method and system for optical three-dimensional topography measurement**. This invention involves projecting patterned illumination onto the surface of an object through an objective lens. A relative movement between the object and the objective is executed, allowing for multiple images of the surface to be captured via a detector. The movement is directed at an oblique angle concerning the optical axis of the objective. This technique enables the derivation of height information from the intensity variations recorded from specific positions on the surface. Additionally, his method incorporates alternating patterned and uniform illumination to enhance height data accuracy for various surface structures.
Career Highlights
Maarten van der Burgt is currently employed at Kla Tencor Corporation, a company known for its expertise in measurement and manufacturing solutions in the semiconductor industry. His innovative work in optical measurement techniques positions him as a valuable asset in advancing technology within this sector.
Collaborations
Throughout his career, Maarten has collaborated with esteemed colleagues, including Guoheng Zhao and Johan De Greeve. Together, they work on projects that emphasize precision in optical measurements, further driving innovation in their field.
Conclusion
Maarten van der Burgt's contributions to optical measurement technologies are noteworthy. His patents reflect a deep understanding of complex measurement systems, showcasing his ability to innovate within the engineering landscape. As he continues to develop new technologies at Kla Tencor Corporation, his work is likely to influence future advancements in optical measurement and related fields.