Milpitas, CA, United States of America

Maarten Brocatus

This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Maarten Brocatus. Retrieved from https://idiyas.com/inventor/maarten-brocatus

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Maarten Brocatus and Semiconductor Inspection Innovation.

Introduction

Maarten Brocatus is an inventor associated with Milpitas, California, and KLA Corporation. His patent work includes a system and method for inspecting and measuring semiconductor devices.

Latest Patents

Brocatus is credited with 1 patent: “System and Method for Inspection and Metrology of Four Sides of Semiconductor Devices.” The invention describes inspecting or measuring all four sides of samples held in a carrier. A pick-and-place stage moves samples into an imaging tool, where two channels capture the first and second sides. The carrier is then rotated by 90 degrees and moved to the opposite side of the tool, allowing the remaining sides to be imaged before the samples are returned to the carrier.

Career Highlights

The patent addresses semiconductor inspection by coordinating sample handling, carrier rotation, and imaging. This approach enables the four sides of a device to be examined using the imaging tool’s two channels.

Collaborations

Bert Vangilbergen and Harry Paredaens are identified as Brocatus’s coworkers. The available information does not specify their roles in the patent or the inspection system.

Conclusion

Maarten Brocatus’s patent describes a coordinated method for inspecting and measuring four sides of semiconductor devices, reflecting his work associated with KLA Corporation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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