Company Filing History:
Years Active: 2010
Title: M Pinar Mengüc: Innovator in Substrate Patterning Technology
Introduction
M Pinar Mengüc is a prominent inventor based in Lexington, KY (US). He has made significant contributions to the field of substrate patterning through his innovative methods and devices. His work focuses on utilizing field emitted electrons to create micro- and nano-sized patterns on substrates, which has implications for various technological applications.
Latest Patents
M Pinar Mengüc holds a patent for "Substrate patterning by electron emission-induced displacement." This patent discloses methods and devices for patterning micro- and/or nano-sized pattern elements on a substrate using field emitted electrons from an element. The disclosed methods can also form nano- and micron-sized depressions in a substrate more economically than previous methods. The techniques include single-step methods that allow for the simultaneous creation and precise location of structures on a substrate. By applying a bias voltage between a probe tip and a substrate held at a close gap distance, current flow can be promoted via field emissions. During a voltage pulse, and within predetermined energy levels and tip-to-surface gap distances, three-dimensional formations can be developed on the substrate surface.
Career Highlights
M Pinar Mengüc is affiliated with Clemson University, where he continues to advance research in substrate patterning technologies. His work has garnered attention for its potential to revolutionize manufacturing processes in various industries.
Collaborations
M Pinar Mengüc has collaborated with notable colleagues, including Jason B Reppert and Jay B Gaillard. These collaborations have contributed to the development and refinement of his innovative techniques.
Conclusion
M Pinar Mengüc is a key figure in the field of substrate patterning, with a focus on utilizing electron emission techniques to enhance manufacturing processes. His contributions are paving the way for more efficient and precise technological applications.
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