Lynn R Allen

Title: The Innovative Contributions of Lynn R Allen

Introduction

Lynn R Allen is a notable inventor based in Camas, WA (US). She has made significant contributions to the field of integrated circuits, holding a total of 3 patents. Her work focuses on methods that enhance the performance and reliability of electronic components.

Latest Patents

One of her latest patents is a method for preventing oxidation in the formation of a via in an integrated circuit. This method involves depositing at least two insulation layers over a copper connection region, including a nitride dielectric material. The nitride layer protects the copper from oxidation during the manufacturing process. Another significant patent addresses the improvement of adhesion between copper and diffusion barrier materials, such as TiN. This innovation allows for better bonding and control over the manufacturing tolerances in integrated circuits.

Career Highlights

Throughout her career, Lynn has worked with prominent companies, including Sharp Kabushiki Kaisha Corporation and Sharp Microelectronics Technology, Inc. Her expertise in integrated circuit technology has made her a valuable asset in the field.

Collaborations

Lynn has collaborated with several professionals, including John Martin Grant and Tue H Nguyen, contributing to advancements in her area of expertise.

Conclusion

Lynn R Allen's innovative work in integrated circuits has led to significant advancements in technology. Her patents reflect her commitment to improving electronic components and their manufacturing processes.