Middleton, ID, United States of America

Lynn J Carroll

This inventor holds 7 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 1999-2005.


% Patents Active = 71.4

Average Co-Inventor Count = 1.4

ph-index = 4

Forward Citations = 59(Granted Patents)


Location History:

  • Boise, ID (US) (2002 - 2004)
  • Middleton, ID (US) (1999 - 2005)

Company Filing History:


Years Active: 1999-2005

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7 patents (USPTO):Explore Patents

Title: Lynn J Carroll: Innovator in Semiconductor Technology

Introduction

Lynn J Carroll is a prominent inventor based in Middleton, ID (US), known for her significant contributions to semiconductor technology. With a total of 7 patents, she has made remarkable advancements in the field, particularly in the area of scanning electron microscopy and wafer manufacturing processes.

Latest Patents

One of her latest patents is a sample mount for a scanning electron microscope. This invention discloses a method for securing a semiconductor wafer sample to a generic base of a scanning electron microscope. The mount features two opposing clamp members that move relative to one another in response to rotational input to a lead screw. By placing a sample between the clamp members and rotating the lead screw, the samples can be clamped for inspection. Once the inspection is complete, the lead screw can be rotated in the opposite direction to release the clamping hold on the sample. The clamp members are adjustable to accommodate varying thicknesses and numbers of specimens. In one embodiment, both clamp members move symmetrically from a common origin, while in another, one clamp member is fixed relative to the mount, and the other moves relative thereto.

Another notable patent is a method for applying a uniform pressurized film across a wafer. This method enhances the manufacturing of semiconductor devices by improving the planarization process for the surfaces of the wafer. The process involves forming a flat planar surface from a deformable coating on the wafer's surface using a fixed resilient flexible material member that contacts the wafer.

Career Highlights

Lynn J Carroll has established herself as a key figure in the semiconductor industry through her work at Micron Technology Incorporated. Her innovative approaches have not only advanced technology but have also contributed to the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout her career, Lynn has collaborated with notable colleagues, including Guy T Blalock and Hugh E Stroupe. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Lynn J Carroll's contributions to semiconductor technology through her patents and collaborations highlight her role as an influential inventor. Her work continues to impact the industry, paving the way for future innovations in semiconductor manufacturing.

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