This inventor holds 8 USPTO granted patents. Top assignees: The United States of America as Represented by the United States, Lawrence Livermore National Security, LLC, The United States of America as Represented by the Department of Energy. Active years: 1982-2022.
Location History:
- Pleasanton, CA (US) (1982 - 1986)
- Livermore, CA (US) (1991 - 2022)
Company Filing History:
4 out of 3,975 
1 out of 1,622 
1 out of 1,211 
Years Active: 1982-2022
Title: The Innovative Contributions of Lynn G Seppala
Introduction
Lynn G Seppala is a prominent inventor based in Livermore, CA (US), known for her significant contributions to the field of high-energy laser systems and x-ray lithography. With a total of 8 patents, her work has had a profound impact on the advancement of optical technologies.
Latest Patents
One of her latest patents focuses on the mitigation of the harmful effects of stray-light reflections in high-energy laser systems. This innovation reduces or eliminates the negative consequences of reflected stray light from lens surfaces by propagating a laser beam through an eccentric pupil that excludes the optical axis of the system. By employing this method, all damage due to focusing of stray light is directed outside of the beam, effectively preventing optical damage.
Another notable patent is the critical illumination condenser for x-ray lithography. This system is particularly adapted for use in extreme ultraviolet (EUV) projection lithography and is based on a ring field imaging system with a laser-produced plasma source. The design utilizes three spherical mirrors to illuminate the mask plane, ensuring that the angles of radiation incident upon each mirror vary by less than eight degrees. This innovative approach enhances the efficiency and effectiveness of x-ray lithography processes.
Career Highlights
Throughout her career, Lynn has worked with various organizations, including the United States of America as represented by the United States. Her expertise in optical systems has positioned her as a leader in her field, contributing to advancements that benefit both research and industry.
Collaborations
Lynn has collaborated with notable individuals such as Andrew M Hawryluk and Natale M Ceglio, further enhancing her innovative work in optical technologies.
Conclusion
Lynn G Seppala's contributions to the fields of high-energy laser systems and x-ray lithography exemplify her dedication to innovation and excellence. Her patents reflect a commitment to advancing technology and improving optical systems, making her a significant figure in the world of inventions.