The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Apr. 19, 2018
Applicant:

Lawrence Livermore National Security, Llc, Livermore, CA (US);

Inventors:

Lynn G. Seppala, Livermore, CA (US);

Alvin C. Erlandson, Livermore, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/00 (2006.01); G02B 5/00 (2006.01); G02B 19/00 (2006.01); G02B 27/30 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0018 (2013.01); G02B 5/003 (2013.01); G02B 19/0009 (2013.01); G02B 19/0047 (2013.01); G02B 27/30 (2013.01);
Abstract

Reduction or elimination of negative consequences of reflected stray light from lens surfaces is achieved by propagating a laser beam through an eccentric pupil that excludes the optical axis of the system, which is rotationally symmetric. In such systems, stray light reflections eventually are focused onto the unique optical axis of the system, in either a real or virtual focal region. By using an eccentric pupil, all damage due to focusing of the stray light lies outside of the beam. These focal regions can, e.g., be physically blocked to eliminate beam paths that lead to optical damage, re-pulse beams and parasitic lasing.


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