Company Filing History:
Years Active: 2005-2010
Title: Biography of Inventor Lynn Cai
Introduction
Lynn Cai is an accomplished inventor based in Union City, California. She holds a total of seven patents, showcasing her expertise in the field of technology and innovation. Her work primarily focuses on advancements in mask defect printability analysis.
Latest Patents
One of her latest patents involves a system and method for providing mask defect printability analysis. This innovative approach utilizes a simulated wafer image of a physical mask alongside a defect-free reference image to generate a severity score for each defect. This scoring system provides customers with meaningful information to accurately assess the consequences of using or repairing a mask. The defect severity score is calculated based on various factors related to changes in critical dimensions of neighboring features to the defect. Additionally, a common process window can be employed to offer objective information regarding defect printability. Other aspects of mask quality, such as line edge roughness and contact corner rounding, can also be quantified using the simulated wafer image of the physical mask.
Career Highlights
Throughout her career, Lynn has worked with notable companies in the technology sector, including Synopsys, Inc. and Numerical Technologies, Inc. Her contributions to these organizations have significantly advanced the field of semiconductor manufacturing and defect analysis.
Collaborations
Lynn has collaborated with esteemed colleagues such as Linard Karklin and Linyong Pang. These partnerships have fostered a collaborative environment that encourages innovation