Lung-Hui Chen

Title: Innovations of Lung-Hui Chen

Introduction

Lung-Hui Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of Lung-Hui Chen's latest patents is related to a metal-insulator-metal (MIM) capacitor within a metallization structure. This innovation involves a metallization structure of an integrated circuit (IC) that includes an intermetal dielectric (IMD) layer, a patterned metal layer embedded in the IMD layer, and a patterned top metal layer disposed on the IMD layer. The design features electrical vias that connect the patterned top metal layer and the patterned metal layer embedded in the IMD layer. The MIM capacitor consists of a first capacitor metal layer that contacts an MIM capacitor landing area of the patterned metal layer and a second capacitor metal layer that contacts a first MIM capacitor terminal area of the patterned top metal layer. An insulator layer is placed between the first and second capacitor metal layers, enhancing the overall functionality of the capacitor.

Career Highlights

Lung-Hui Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the semiconductor industry. His expertise in integrated circuit design has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Lung-Hui Chen has collaborated with notable colleagues, including Chi-Han Yang and Kuan-Yu Chen. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Lung-Hui Chen's contributions to the field of integrated circuits and his innovative patents demonstrate his commitment to advancing semiconductor technology. His work continues to influence the industry and pave the way for future innovations.