Wuerzburg, Germany

Lukas Worschech


Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2014-2015

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2 patents (USPTO):

Title: Innovations of Lukas Worschech in Laser Technology

Introduction

Lukas Worschech is a notable inventor based in Wuerzburg, Germany. He has made significant contributions to the field of laser technology, particularly through his innovative patents. With a total of two patents to his name, Worschech's work focuses on interband cascade laser amplifier mediums.

Latest Patents

Worschech's latest patents include an interband cascade laser amplifier medium that features a series of cascades designed to enhance the efficiency of laser emissions. The first patent describes an amplifier medium with an electron injector region, an amplifier region, and an electron collector region. The amplifier region incorporates a hole quantum film made from a first semiconductor material and an electron quantum film made from a second semiconductor material. The second patent also outlines a similar interband cascade laser amplifier medium, emphasizing the use of a III-V compound semiconductor that includes multiple elements for optimal performance. This technology is capable of efficient laser emission at wavelengths exceeding 2.5 micrometers.

Career Highlights

Throughout his career, Lukas Worschech has worked with prominent organizations such as Nanoplus Nanosystems and Technologies GmbH and Julius-Maximilians-Universität-Würzburg. His experience in these institutions has allowed him to refine his expertise in laser technology and semiconductor materials.

Collaborations

Worschech has collaborated with notable colleagues, including Adam Bauer and Sven Hoefling. These partnerships have contributed to the advancement of his research and the development of innovative technologies in the field.

Conclusion

Lukas Worschech's contributions to laser technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in laser applications and semiconductor technology.

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