Tampere, Finland

Lukas Scheer

This inventor holds 1 USPTO granted patent. Top assignee: Hexagon Innovation Hub Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lukas Scheer. Retrieved from https://idiyas.com/inventor/lukas-scheer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Lukas Scheer: Optical Measurement Innovation

Introduction

Lukas Scheer is an inventor associated with Tampere, Finland. His patent work focuses on optical measurement technology for inspecting the surfaces of target objects, including glossy surfaces and their defects.

Latest Patents

Scheer is associated with 1 patent: “Arrangement for Optical Measurements and Related Method.” The invention describes an optical inspection arrangement with a diffusive, semi-transparent illumination structure shaped like a hollow tunnel that can partially surround a target object. LED light sources are arranged in a matrix along the tunnel’s curved cross-section and length, and illuminate the object through the structure. An imaging device captures the object’s surface, supporting measurement of its shape and the detection of surface defects.

Career Highlights

Scheer is associated with Hexagon Innovation Hub GmbH. His patent highlights an approach to surface inspection that combines distributed LED illumination with imaging, with potential applications in evaluating object geometry and surface quality.

Collaborations

Petri Lehtonen is identified as Scheer’s coworker. Their professional association connects Scheer’s work to a broader innovation environment at Hexagon Innovation Hub GmbH.

Conclusion

Lukas Scheer’s patent centers on an illuminated tunnel-shaped arrangement for optical surface measurement, reflecting his contribution to inspection technology in Tampere, Finland.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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