Ivancice, Czechia

Lukas Kral

This inventor holds 2 USPTO granted patents. Top assignee: Fei Comapny. Active years: 2020-2021.


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: Innovations of Lukas Kral

Introduction

Lukas Kral is a notable inventor based in Ivancice, Czech Republic. He has made significant contributions to the field of charged-particle beam technology. With a total of 2 patents, Kral's work focuses on enhancing the capabilities of CPB microscopes and dual-beam systems.

Latest Patents

Kral's latest patents include a "System and method for beam position visualization." This invention aligns a charged-particle beam to a primary axis of a CPB microscope by determining a first beam deflection drive. The beam deflector is equipped with a second beam deflection drive during the working mode to propagate the beam along the primary axis. The second drive is determined based on the first beam deflection drive. Another significant patent is "Focused ion beam impurity identification." This dual-beam system operates in an analysis mode, where an ion beam can be deflected by the CPB into one or more component beams. This system can identify the ion species of the non-primary ion beams.

Career Highlights

Lukas Kral is currently employed at FEI Company, where he continues to innovate in the field of microscopy and beam technology. His work has been instrumental in advancing the capabilities of analytical tools used in various scientific applications.

Collaborations

Kral collaborates with talented individuals such as Jeremy Graham and Branislav Straka. Their combined expertise contributes to the development of cutting-edge technologies in their field.

Conclusion

Lukas Kral's contributions to the field of charged-particle beam technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing scientific research and technology.

Profile summary based on public USPTO records.
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